Temperature-dependent strain relaxation of the AlGaN barrier in AlGaN∕GaN heterostructures with and without Si3N4 surface passivation

Abstract

The temperature dependence of strain relaxation in Al0.22Ga0.78N layers, with and without a Si3N4 surface passivation layer, was investigated at temperatures from room temperature to 813K using high-resolution x-ray diffraction. A small strain relaxation occurs in the unpassivated Al0.22Ga0.78N layers at high temperature. After passivating, an additional in-plane tensile strain and an initial increase of the residual tensile strain with increasing temperature were observed in Al0.22Ga0.78N layers, and at higher temperatures the residual tensile strain only decreases slightly in the 100-nm-thick Al0.22Ga0.78N layer, but a pronounced strain relaxation occurs in the 50-nm-thick one. The degree of strain relaxation of the passivated 50-nm-thick Al0.22Ga0.78N layer increases by about 33%, which results in the two-dimensional electron gas concentration reduction of about 16% at the whole temperature range in our measurements.