Abstract
Low thickness silver (Ag) coatings (thickness ∼25 nm) were fabricated by electron beam evaporation technique equipped with glancing angle deposition (GLAD, 86°) arrangement at varrying substrate heating temperatures (viz 30 °C, 75 °C, 125 °C and 150 °C). Although all the GLAD-Ag films prepared up to 125 °C temperature were found to be plasmonic in nature, the localized surface plasmon resonance (LSPR) band was more prominent at 125 °C and disappeared at 150 °C temperature. The dielectric contribution in the overall dispersion of sample structure was maximum for 125 °C with dominating metallic contribution observed for 150 °C. Detailed investigation of 125 °C deposited GLAD-Ag sample revealed sharpening of the LSPR band with reduction in film thickness. The ultra-thin coating (∼5 nm) was found to be purely dielectric in nature with the most prominent LSPR band among the others. Overall, the substrate heating temperature of 125 °C was found to be the threshold for fabricating plasmonic GLAD-Ag films with the best result observed for the ultra-thin (∼5 nm) specimen.
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