Temperature mapping of reactive gas layer in thermal plasma chemical vapor deposition

Abstract

Two-dimensional temperature maps of reactive gas layers were produced using pulsed laser Rayleigh scattering thermometry. The measurements were made in conditions of diamond film chemical vapor deposition (CVD) using a thermal inductively coupled plasma. In these conditions, the reactive gas layer is typically a few millimeters thick and the temperature drops across the layer from 4000 K at the free stream boundary to about 1200 K at the substrate. The reactive layer exhibits strong chemical nonequilibrium. Rayleigh scattering was induced using a pulsed laser sheet at 532 nm wavelength. The scattered radiation was detected and calibrated with an intensified charge coupled device camera. Temperature maps and axial profiles obtained under parametric variation of the gas flow conditions demonstrate how the technique can be employed to measure the reactive layer thickness and its radial distribution across the substrate. The results demonstrate that imaging Rayleigh scattering thermometry can be employed as a nonintrusive diagnostic tool to obtain useful experimental information pertinent to the gas phase chemistry in diamond CVD under conditions of extremely large temperature gradients.