Temperature-dependent Schottky diode behavior of Ni Schottky contacts to α-Ga2O3 film epitaxially grown on sapphire substrate

Abstract

We fabricated Ni Schottky contacts on α-Ga2O3 epitaxial layers grown on a c-plane sapphire substrate and explored their current–voltage (I–V) characteristics dependence on temperature spanning over a wide temperature range of 100–425K. The Ni/α-Ga2O3 Schottky diode displayed excellent rectification, exhibiting a high barrier height of 1.39 eV, a low leakage current of the order 10−12 A, and a breakdown voltage of 215 V at room temperature. The reverse leakage current was confined within an order of magnitude over the entire measured temperature range, indicating the thermal stability of the diode. A large ideality factor of 1.20 attained at room temperature clearly indicates the diode behavior deviation from the ideal thermionic emission theory. The I–V characteristics revealed that the barrier height and ideality factor shows strong temperature dependence, indicating the existence of barrier inhomogeneity at the Schottky interface. An analysis of the barrier inhomogeneity using the thermionic emission with the assumption of a Gaussian barrier height distribution implies the prevailing double Gaussian barrier height distribution in the Ni/α-Ga2O3 Schottky diode with a transition at 250 K. The Richardson constant derived from the modified Richardson plot, evaluated by assuming the barrier height Gaussian distribution, was close to the theoretical Richardson constant of α-Ga2O3.