Abstract
In this work, we present the sequential growth of metal–semiconductor bilayer structure on HF-treated textured glass substrates by thermal evaporation method. The process of aluminum-induced crystallization of amorphous germanium thin films was critically observed under heat treatment. Temperature assisted structural modifications triggered the nucleation phenomenon for controlled grain growth which transformed the nature of Ge-thin film from amorphous-to-polycrystalline. Interestingly, the electrical resistivity also decreased by subsequent annealing which promoted the conduction mechanism. Optical measurements indicated a dwindling in band tail states and related structural defects, leading to better crystallinity.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
