Abstract
Adsorption of egg-phosphatidylcholine vesicles and bilayer formation on a SiO2 surface was investigated in the temperature range 278-303 K using the quartz crystal microbalance-dissipation technique. The critical coverage for the vesicle-->bilayer transition is found to decrease with increasing temperature. The temperature dependence of the time-scale characterizing this transition can be represented in the Arrhenius form. Higher temperatures produce a bilayer with fewer trapped, nonruptured vesicles.
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