Abstract

An atmospheric pressure plasma source in which the gas temperature can be accurately controlled from below freezing point up to a high temperature has been developed. In general plasma devices, an electrical discharge is passed through a gas at about room temperature to generate plasma, so the plasma is at a temperature higher than room temperature; moreover, the gas temperature is determined by the discharge condition such as discharge power and plasma gas flow rate, so accurate temperature control is difficult. In the plasma source that has been developed in this research, the gas that is to be supplied to the discharge unit is first cooled using a gas cooler and then heated by a heater. The gas temperature of the produced plasma is measured, and feedback is sent to the heater. Thus, plasma at a desired temperature can be generated. Gas temperature control of the plasma over a range from -54 °C to +160 °C with a standard deviation of 1 °C was realized. Spectroscopic characteristics of generated plasma were investigated. This plasma source/technique will realize that effective plasma is applicable for heat-sensitive materials such as paper, textile, polymer, and especially human tissue. Furthermore, it enables us to generate the plasma at optimal gas temperature for chemical reaction of each plasma treatment.

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