Abstract
In this paper, regular systems of silicon and platinumassemblies have been fabricated in athree-dimensional (3D) void sublattice of synthetic opal.Silicon was introduced into opal pores bythermal CVD.The filling of the opal pores was varied by changing theparameters of the CVDprocess.The samples were also filled with platinum from a solution of platinumtetrachloride inethanol in order to fabricate metal contact to silicon.A detailed TEM and HREM structural study ofopal-Si and opal-Pt-Si composites was carried out using JEM4000EXIIand JEM2010 electronmicroscopes.It was found that silica spheres in regular opal-Si compositesare uniformly coveredwith a nanocrystalline silicon layer up to 25-30 nm thick.To form the Pt-Si contact,the silica sphereswere coated with platinum before being embedded in silicon.The presence of a substructurein the silica spheres ensures a uniform distribution of platinumover the sphere surface.
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