Abstract
AbstractIn this study, the crystal structure of Co thin films deposited by a low‐energy sputtering, gas flow sputtering (GFS) and conventional RF magnetron sputtering (MS) is investigated. The emphasis is on whether fcc‐like regions are present in a hcp‐Co film. X‐ray diffraction (XRD) shows no fcc peak for both films deposited by GFS and MS. Electron diffraction reveals that fcc structure is present in the film deposited by MS. Lattice images are observed by using transmission electron microscopy. Every other line in the lattice image of the film deposited by GFS is bright or dark, which is suggestive of the ABAB stacking of the hcp structure. In addition, stacking faults are observed. Copyright © 2008 Institute of Electrical Engineers of Japan. Published by John Wiley & Sons, Inc.
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