Abstract

Thin films with low adhesion and large residual stresses may buckle. The resulting morphologies are varied, but one of the most commonly observed is an intriguing oscillating pattern – the so-called “telephone cord” – which has been extensively investigated in the recent years. We have studied the kinematics of formation of telephone cords using a geometrically non-linear plate model and mode dependent interfacial toughness, captured via a cohesive zone. Through extensive Finite Element Simulations, we have demonstrated a simple, non-trivial relation between telephone cord wavelength and interfacial toughness. To validate this prediction, highly stressed Mo thin films were deposited on Si wafers, with a well defined interface and very reproducible adhesion. Studying the morphology of the resulting buckles for different film thicknesses and stresses, we observed a trend which was fully consistent with our simulation results. From the data fit, an adhesion energy of 0.58±0.04Jm−2 for the SiO2/Ag interface was inferred, which compares well with literature estimates.

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