Technology of static oblique lithography used to improve the fidelity of lithography pattern based on DMD projection lithography

Abstract

This paper proposes a static oblique lithography (SOL) strategy based on conventional digital micromirror device (DMD) projection lithography. This strategy combines the oblique lithography on oblique scanning lithography with static lithography to ensure that we can produce high fidelity microstructures with very smooth curved edges in all directions and more accurate relative line positions. Not only does the single-axis high-precision micromotion stage of this strategy enable a significant reduction in fabrication cost, but also enables the lithography of subpixel-width curves with smooth edges used our improved sub-pattern quantization strategy. The intensity distribution of the actual diffracted light field at the focal point of the helical zone plate fabricated by the SOL is highly matched with the intensity distribution of the designed simulated light field. This shows that the SOL can play an important role in the field of micro-optical device fabrication.