Abstract
Ion-plasma sputtering and codeposition of ultrafine Ta and Cd particles on a moving substrate were used to prepare the solid solutions, in particular, the alloys with up to 66.2 at.% Cd in the form of coatings. In vacuum heat treatment cadmium evaporates at 700°C from cadmium based solid solutions resulting in formation of a porous tantalum with a highly developed surface. The prepared tantalum-based materials assume the technological application of the investigation results.
Highlights
The methods for preparing of porous metals, known to date, are multi-staged and complicated [1] [2]
The most promising seems the preparation of a mixture of refractory metal with metal characterized by high vapor pressure at a relatively low temperature, cadmium
We studied the tantalum-cadmium films prepared by codeposition of ultrafine particles of the metals, which were obtained by ion-plasma sputtering on cols substrates made from monocrystalline silicon
Summary
The methods for preparing of porous metals, known to date, are multi-staged and complicated [1] [2]. The potential application of film tantalum in the form of porous coating, prepared as an alloy and followed by removal of the second metal, has determined the interest towards possible preparation of tantalum-cadmium solid solutions and their structure. The peculiarity of this system is the absence of cadmium solubility in tantalum under normal conditions and the high pressure of cadmium vapor at relatively low temperatures (boiling temperature at atmospheric pressure is 766.3 ̊C), which determines the possibility to transfer cadmium from solutions into the vapor at relatively low temperatures [9] with the pores remaining in the tantalum matrix. The aim of the completed investigation was to study the morphology, the phase composition, depending on metals concentration, and the thermal resistance of the tantalum-cadmium coatings
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