Technology for cleaning glass substrates in glow discharge plasma for microfluidics applications

Abstract

The production of microfluidic chips is increasing every year because the technology using the chip allows you to make an express test to obtain the analysis, as well as economically viable. Often microfluidic chips are based on glass in which the microchannels are formed. Accurate production of a microfluidic device requires careful preparation of the glass substrate to improve adhesion for further application of functional layers. The choice of cleaning mode strongly affects the output product, so a clear understanding of what factors affect the quality of cleaning in HF plasma is needed. Mathematical modeling of dependence between plasma power of the glow discharge, time and gas medium first of all gives understanding which cleaning mode is optimal and which parameter affects stronger very relevant for development of this potentially promising technology of quality products.