Abstract
A new technological process for fabricating structures with vertical walls in a thick layer of macroporous silicon on a substrate is reported. The problem of photolithography has been solved by patterning on the back side of the wafer. As a result, the silicon substrate itself serves as a mask through which certain parts of the porous layer are removed. Narrow and high bars of macroporous silicon, aligned with macropore rows, have been fabricated. The 2D photonic crystals obtained have been used for in-coupling of light in the direction perpendicular to the channel axes and for recording IR spectra.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.