Abstract
A new technological process for fabricating structures with vertical walls in a thick layer of macroporous silicon on a substrate is reported. The problem of photolithography has been solved by patterning on the back side of the wafer. As a result, the silicon substrate itself serves as a mask through which certain parts of the porous layer are removed. Narrow and high bars of macroporous silicon, aligned with macropore rows, have been fabricated. The 2D photonic crystals obtained have been used for in-coupling of light in the direction perpendicular to the channel axes and for recording IR spectra.
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