Abstract
10 keV Ar+ ion implantation induced modifications of nanoscale Co20Fe60B20/SmCo5/Si-substrate heterostructures have been investigated. Magneto-optic Kerr effect study reveals that the coercivity enhances by more than ten times after implantation. Implantation gives rise to an increase in surface roughness and densely packed grains as evident from the Atomic Force Microscopy study. X-ray reflectivity analysis manifests ion beam induced intermixing between elements of two layers at the interface and significant changes in the internal structure. Monte Carlo simulation study corroborates the x-ray reflectivity results. Enhancement of coercivity attributed to interface mixing and implantation induced defect creation in the films.
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