Abstract
AbstractInvited for this month's cover is the group of Mari‐Ann Einarsrud at the Norwegian University of Science and Technology (Norway). The cover picture shows our in‐situ X‐ray diffraction setup for analysing the crystallization process in oxide thin films made by chemical solution deposition. By adjusting the process parameters, the nucleation and growth conditions are changed and the degree of preferred orientation and epitaxi in the oxide films can be tailored. This change is illustrated by the change in microstructure of the polycrystalline films with random orientation (left) towards highly oriented cube‐on‐cube grown films (right) where the film unit cell follows that of the substrate. This effect can be observed experimentally by the appearance of spot reflection instead of full diffraction rings on the detector. Read the full text of their Full Paper at 10.1002/cmtd.202100064.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
