Abstract
Antireflective surfaces composed of biomimetic sub-wavelength structures that employ the‘moth eye principle’ for reflectance reduction are highly desirable in many opticalapplications such as solar cells, photodetectors and laser optics. We report an efficientapproach for the fabrication of antireflective surfaces based on a two-step process consistingof gold nanoparticle mask generation by micellar block copolymer nanolithographyand a multi-step reactive ion etching process. Depending on the RIE processparameters nanostructured surfaces with tailored antireflective properties caneasily be fabricated that show optimum performance for specific applications.
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