Abstract
Periodic arrays of metallic Ag nanoparticles have been fabricated on various solid substrates for the potential application in nano-electronics and nano-photonics by block copolymer photolithography. Spin-coated diblock copolymer thin film with well-ordered and vertically oriented cylindrical nanodomains was utilized as the template. Ag + was selectively doped in the cylindrical nanodomain by just placing a few drops of AgNO 3 aqueous solution on the film. Both photochemical reduction of Ag + to metallic Ag and concomitant photo-etching of the diblock copolymer template have been achieved under vacuum ultraviolet light irradiation, resulting in a direct transcription of the periodic pattern of diblock copolymer template to the metallic Ag nanoparticle array with the consistent periodicity.
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