Abstract

ABSTRACTProton NMR and proton-29Si double resonance NMR have been performed on hot wire a-Si:H films deposited from SiH4. Results are compared with those from conventional plasma enhanced chemical vapor deposition a-Si:H. Proton nutational angle studies and proton-29Si spin-echo double resonance (SEDOR) signals at 80 and 294 K indicate that a significant proton resonance population arises from T-site-trapped molecular H2. The hot wire films also display a ≥80 kHz FWHM uperbroad proton line and a sharp feature diamagnetically shifted by 25 ppm.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call