Abstract
We describe herein a systematic regeneration of waste sulfuric acid produced in semiconductor manufacturing, using batch vacuum distillation (BVD). During the recycling process, dilute sulfuric acid feed was continuously concentrated and fed back to the original wafer washing step. It consisted of a batch tank to charge the feed solution, condenser to capture generated vapor, receiving tank to receive condensed distillate liquid, and vacuum pump to reduce the system pressure. The improper control of the vacuum operation led to incomplete condensation; consequently, the vacuum pump became dysfunctional. The goal of this study was to prevent such mishap. After the feed condition was defined, a basic design was conceived, and the main characteristics of the BVD were determined. The results of sensitivity analyses on the feed and operating conditions have been discussed. The strategies for designing the vacuum pump’s capacity should be changed depending on phase equilibria at the target pressure.
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