Abstract

Through advances in X-ray Lithography, Contact Microradiography at submicrometer resolution is now commonly practiced. As with other forms of microscopy, eg Projection X-ray Microscopy, a 3 dimensional view can substantially enhance the usefulness of Contact Microradiography. The author wishes to show how this is accomplished by reporting previously unpublished work which demonstrates these possibilities and by projecting how the technique may possibly be applied at submicrometer resolution.In the winter of 1949-50 while doing exploratory work on various forms of X-ray microscopy at General Electric, the author carried out comparative tests in his home laboratory on Contact Microradiography at accelerating potentials from 1.5 to 10 KV. A schematic of the demountable source and camera is shown in fig 1. The electron focusing system, independently discovered at about the same time by Ehrenberg and Spear, is simple and obvious. For this paper we are more concerned with the specimen holder and camera which are separated form the x- ray source by a thin beryllium window.

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