System and process learning in a full-field, high-power EUVL alpha tool

William P Ballard,Steven J Haney,Kenneth A Goldberg,Tony G Smith,Harry Shields,Layton C Hale,Leonard E Klebanoff,Randall J St Pierre,James L Van De Vreugde,Philip A Grunow,Samuel Ponti,Therese L Porter,Terry A Johnson,Joel R Darnold,Kenneth L Blaedel,William C Replogle,Daniel A Tichenor,John B Wronosky,Yon E Perras,Gary E Sommargren,Sang Hun Lee,Henry N Chapman,Eric M Gullikson,Mark D Zimmerman,Karen L Jefferson,Samuel Graham ,Patrick Naulleau ,Richard Campiotti ,D Buchenauer ,P K Barr ,Luis J Bernardez ,Donna J O’connell ,Kenneth Williams ,Alvin H Leung,John S Taylor,Daniel J Knight ,R J Anderson ,Robert E Lafon

doi:10.1117/12.482791

System and process learning in a full-field, high-power EUVL alpha tool

William P Ballard, Steven J Haney + Show 36 more

https://doi.org/10.1117/12.482791

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Publication Date: Jun 13, 2003

Citations: 7

Affiliation: Lawrence Berkeley National Laboratory, TRW Automotive (United States), Intel (United States), Lawrence Livermore National Laboratory, W.M. Keck Observatory

#Laser-produced Plasma Source #Laser-produced Plasma + Show 8 more

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Abstract

Full-field imaging with a developmental projection optic box (POB 1) was successfully demonstrated in the alpha tool Engineering Test Stand (ETS) last year. Since then, numerous improvements, including laser power for the laser-produced plasma (LPP) source, stages, sensors, and control system have been made. The LPP has been upgraded from the 40 W LPP cluster jet source used for initial demonstration of full-field imaging to a high-power (1500 W) LPP source with a liquid Xe spray jet. Scanned lithography at various laser drive powers of >500 W has been demonstrated with virtually identical lithographic performance.

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