Synthesis, structural and magnetic properties of physical vapor deposited Fe/Si(100) and Fe/Si(111) thin films

Abstract

Series of iron thin films have been deposited under vacuum, by thermal evaporation, onto monocrystalline Si(100) and Si(111) substrates. The thickness ranges from 13 to 69 nm. The structural properties have been studied by X-ray diffraction technique, working in the θ–2θ mode and with the Kα Cu radiation (λ = 1.54056 A). The films morphologies have been scanned using atomic force microscopy. Most of the films present a flat surface. The static magnetic measurements were performed by means of a vibrating sample magnetometer, with the external magnetic field applied parallel and perpendicular to the surface of the films. All the films are polycrystalline and present well defined Bragg peaks. Most of the films are under stress. The easy magnetization axis lies in the film plane for all the samples. Values of squareness up to 1 have been measured in the longitudinal configuration. In Fe/Si (100), coercivity seems to depend closely on crystallite size. All these results will be presented and discussed.