Abstract
We report a direct electrochemical deposition process to produce ZnO nanorods or a ZnO thin film on an indium tin oxide (ITO) substrate. The ZnO film was etched by an agarose stamp containing HCl as the etchant to form different patterns. The structure, morphology, and electrochemical properties of the ZnO thin films on the ITO substrate were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), and scanning electrochemical microscopy (SECM).
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