Abstract
AbstractIn this work we have developed a computer controlled sol‐gel dip method using Zn‐acetate and/or Mg‐acetate as sources, which is designed for fabricating ZnO/MgZnO multilayer films automatically. The film thickness can be controlled precisely, by choosing sol‐gel source concentrations, pulling speeds of substrates, and stack numbers. High quality MgxZn1–xO films (x=0.18) have been synthesized using a sol‐gel source incorporated with 20% Mg‐acetate. The Mg content can be increased up to x=0.25, which exhibits the largest bandgap of 3.760 eV. We have successfully fabricated nano‐sized structures consisted of (ZnO(9nm)/Mg0.18Zn0.88O(6nm))10 on sapphire (001) substrates. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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