Abstract

The paper presents a review on the current methods for deposition of vertically oriented multilayer graphene sheets (often called carbon nanowalls—CNWs) on solid substrates. Thin films of CNWs are among the most promising materials for future applications in capacitors, batteries, electrochemical devices, and photovoltaics, but their application is currently limited by slow deposition rates and difficulties in providing materials of a desired structure and morphology. The review paper analyzes results obtained by various groups and draws correlations between the reported experimental conditions and obtained results. Challenges in this scientific field are presented and technological problems stressed. The key scientific challenge is providing the growth rate as well as morphological and structural properties of CNWs thin films versus plasma parameters, in particular versus the fluxes of reactive plasma species onto the substrate surface. The technological challenge is upgrading of deposition techniques to large surfaces and fast deposition rates, and development of a system for deposition of CNWs in the continuous mode.

Highlights

  • Nanocarbon has attracted enormous attention in the past two decades. It can exist in various configurations such as graphene, carbon nanotubes (CNTs), or carbon nanowalls (CNWs)

  • With increasing bias voltage and temperature, the morphology changed from nanorods which were formed at low bias voltage and temperature, to thorny structures, followed by straight CNWs, whereas curled CNWs were formed at high bias voltages and temperatures

  • In the case of RF plasmas, CCP configuration is often combined with ICP or an external H radical injection [13,16]

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Summary

Introduction

Nanocarbon has attracted enormous attention in the past two decades It can exist in various configurations such as graphene, carbon nanotubes (CNTs), or carbon nanowalls (CNWs). Carbon nanowalls are often referred to as “multilayer graphene sheets stretching perpendicularly to the substrate surface”. A way to implement this material in a mass production is depositing graphene. Exact growth mechanisms are far from production is depositing graphene perpendicular to a substrate surface and taking fullbeing growth mechanisms are far from being well-understood; both theoretical and experimental advantage of its unique properties. Number of CNT publications methods for deposition of carbon nanowalls as well as their properties where they are reported. C2H2) ison partially atomized and ionized plasma conditions and the resultant radicals condensate nanowalls (multilayer graphene sheets) grows on the substrate surface. 33and can summarized asfollows follows nanowalls (multilayer graphene sheets) grows on the substrate

Adsorption
Bonding of reactive carbon species to the edge of graphene
Early Scientific Documents of Plasma Synthesis of Carbon Nanowalls
A Brief Review of Patents
Summary of Literature Review on PECVD Deposition of CNWs
Important Findings
F8 with H2
Comparison of Available Literature
Theingrowth rate versus the temperature as reported in literature shown
Challenges and Roadmap
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