Abstract
High roughness of several hundreds of nanometers and low free energy introduced the superhydrophobic surface with a high water contact angle of approximatelt 160 degrees for the chemically modified silicon oxide nanowires on silicon wafer. Particularly, a very small rolling angle of < 5 degrees with the annealed sample was observed. The nano-structure with high roughness and organic perfluoroalkysilane coating with CF2/CF3 groups contributed the superhydrophobicity. The present superhydrophobic nanowires surface on silicon wafer suggests the potential applications in self-cleaning semiconductor devices such as radar surface, solar cell.
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