Abstract

Two-dimensional layered materials have attracted tremendous attention as photodetectors due to their fascinating features, including comprehensive coverage of band gaps, high potential in new-generation electronic devices, mechanical flexibility, and sensitive light-mass interaction. Currently, graphene and transition-metal dichalcogenides (TMDCs) are the most attractive active materials for constructing photodetectors. A growing number of emerging TMDCs applied in photodetectors bring up opportunities in the direct band gap independence with thickness. This study demonstrated for the first time a photodetector based on a few-layer Re x Mo1-x S2, which was grown by chemical vapor deposition (CVD) under atmospheric pressure. The detailed material characterizations were performed using Raman spectroscopy, photoluminescence, and X-ray photoelectron spectroscopy (XPS) on an as-grown few-layer Re x Mo1-x S2. The results show that both MoS2 and ReS2 peaks appear in the Re x Mo1-x S2 Raman diagram. Re x Mo1-x S2 is observed to emit light at a wavelength of 716.8 nm. The electronic band structure of the few layers of Re x Mo1-x S2 calculated using the first-principles theory suggests that the band gap of Re x Mo1-x S2 is larger than that of ReS2 and smaller than that of MoS2, which is consistent with the photoluminescence results. The thermal stability of the few layers of Re x Mo1-x S2 was evaluated using Raman temperature measurements. It is found that the thermal stability of Re x Mo1-x S2 is close to those of pure ReS2 and MoS2. The fabricated Re x Mo1-x S2 photodetector shows a high response rate of 7.46 A W-1 under 365 nm illumination, offering a competitive performance to the devices based on TMDCs and graphenes. This study unambiguously distinguishes Re x Mo1-x S2 as a future candidate in electronics and optoelectronics.

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