Synthesis of porous silicon, nickel and carbon layers by vapor phase dealloying

Abstract

Porous thin films have various application fields, e.g., for energy conversion in fuel cells , energy storage in lithium ion batteries or supercapacitors as well for catalysis, filtration and sensing. We synthesized porous thin films by co-evaporating a low-vapor-pressure material (e.g., Si, Ni or C) together with zinc and depositing a compact layer of resulting composite. High-rate deposition process up to 100 nm/s was realized by electron beam physical vapor deposition (EB-PVD) of the materials from two graphite crucibles with a fast deflected electron beam in high vacuum. Immediately after deposition, the coated substrates were heated up in vacuum to a temperature above 500 °C and thereby zinc is removed selectively. Due to its higher vapor pressure against that of remaining component, zinc is expelled from the layer and vacancies are generated by so called vapor phase dealloying (VPD). We investigated the feasibility of VPD process for the elements silicon, nickel and carbon. The elemental composition and the morphology of the layers prior and after thermal annealing were analyzed by scanning electron microscopy, by energy-dispersive X-ray spectrometry and by X-ray diffraction. • High-rate deposition of compact multiphase layers by co-evaporation of Zn together with Si/Ni/C • Layer morphology can be adjusted by deposition parameters. • Subsequent thermal annealing in vacuum for expelling zinc and generating pores • Porous structure can be adjusted by layer morphology and annealing parameters.