Synthesis of Polystyrene Thin Films by Means of an Atmospheric-Pressure Plasma Torch and a Dielectric Barrier Discharge

Abstract

In this paper, the deposition and characterization of plasma-polymerized polystyrene (pp-PS) using PECVD under atmospheric pressure on a variety of substrates was investigated. An atmospheric RF plasma torch and an HF dielectric-barrier-discharge (DBD) system were used to deposit thin pp-PS coatings on PTFE, HDPE, stainless steel, glass, and silicon wafer. The styrene vapor was carried by Ar or He. The pp-PS films were characterized by Fourier transform infrared spectroscopy (FTIR) (infrared reflection absorption spectroscopy), X-ray photoelectron spectroscopy (XPS), water contact angle (WCA), static secondary ion mass spectroscopy (SSIMS), and optical microscopy, and the plasma phase was studied by optical-emission spectroscopy. The major features that characterize PS are present in the FTIR, SSIMS, and XPS spectra of our films, although some differences are observed between pp-PS and their conventionally polymerized counterparts: oxygenation, branching, degree of cross-linking, and unsaturation. According to the WCA and XPS results, the films deposited by the RF plasma torch (placed in a Plexiglass chamber) are more oxygenated than those deposited by DBD, which is operated under a much more controlled atmosphere. A comparison of the chemical structure of the deposited coatings (branching, cross-linking) as a function of the nature of the carrier gas was established by FTIR: pp-PS synthesized in the presence of Ar (for both processes) exhibit more branching and a higher degree of cross-linking than pp-PS synthesized with He as the main plasma gas. The optical microscopy points out a diversity of structures that depend on the nature of the substrate and the plasma parameters.