Synthesis of Polystyrene and Poly(methyl methacrylate) Each with a Phenyl Seleno Group at Terminal Chain End by Radical Polymerization in the Presence of Benzyl Phenyl Selenide as a Photoiniferter

Abstract

The photopolymerization of styrene with benzyl phenyl selenide proceeded smoothly to give polystyrene having benzyl and phenylseleno groups at α- and ω-chain ends, respectively, and the degree of functionality was 0.95. In a limited range of conversion, both the polymer yields and number average of molecular weights (M̄n) increased with the reaction time and the M̄n linearly increased with yield. The addition of styrene to the polystyrene with irradiation increased the molecular weight of the polymer. In the photopolymerization of methyl methacrylate, similar polymerization behavior was observed. The tacticity of the poly(methyl methacrylate) was in good agreement with that prepared by radical mechanism. Photoirradiation of polystyrene having phenylseleno group at the ω-end in the presence of methyl methacrylate effectively afforded a block copolymer of styrene and methyl methacrylate.