Synthesis of One-Dimensional Nanostructured Silicon Carbide by Chemical Vapor Deposition

Abstract

Nanorods of the wide-bandgap semiconductor silicon carbide belong to a promising group of one-dimensional materials with potential applications extending from reinforcement of composites to applications as building blocks that can be logically assembled into appropriate two- (and three-) dimensional architectures, permitting researchers to exploit their unusual electronic, optical, and other properties. Specific to the most common silicon carbide polytypes are a low intrinsic carrier concentration, an exceptionally high breakdown electric field, high thermal conductivity, high-temperature stability, and resistance to an aggressive environment. This should permit one to develop even submicron-level SiC-based devices operating under high-temperature, high-power, and/or high-radiation conditions, under which conventional semiconductors cannot function. Detailed control of the conditions favorable for the nucleation and growth processes of nanorods of a given SiC polytype is necessary because the electrical and optical properties of each SiC polytype are very different. Therefore, a systematic investigation of factors that primarily influence the morphology and polytype of a vapor-phase-grown SiC has been made in the present work. These factors were the temperature, the flow rates of the gaseous precursors, and the Si/C molar ratio in the gas phase. In order to investigate the role of these factors, the “cold gas-hot substrate” chemical vapor deposition (CVD) method has been applied, because it permits them to be closely controlled in a wide range. While in the overwhelming majority of previous investigations nanorods of the 3C SiC polytype have been grown, the present work delineates conditions that are favorable for the growth of single-phase 2H, 3C, 15R, and 6H SiC nanorods, respectively.