Synthesis of New Functional Silicon-Based Condensation Polymers

Abstract

Abstract A new class of photosensitive aromatic polymers containing disilane units was successfully synthesized from new disilane-based monomers such as 1,2-bis(diethylamino)tetramethyldisilane and 1,2-bis(p-aminophenyl)tetrarnethyldisilane. The disilane-contain-ing aramids and polyimides had glass transition temperatures above 190°C, and all the polymers were thermally stable up to 300°C in air. The polymers were photosensitive; their molecular weight decreased rapidly upon ultraviolet light irradiation. The photosensitive polymers, especially the soluble polyimides having diphenyl sulfone units, were potential candidates for positive working photoresist materials. New highly branched polysiloxane star-burst polymers were synthesized by a siloxane synthetic reaction starting from tris[(phenyldimethylsiloxy)dimethylsiloxy]methylsilane and bis[(phenyldimethylsiloxy)methylsiloxy]dimethylsilanol as the initial core (G0-Ph) and the building block, respectively. Thus, the first generation polymer G1-Ph, second...