Abstract
In this work, ZnO nanoporous thin films were formed by anodizing of Zn plates in 500 ml distilled water of 25°C at voltage ranged from 10 V to 30 V. As anodized zinc plates were characterized by using SEM and XRD. Characterization of as anodized Zn plates using SEM showed that the morphology of the as anodized Zn plates were significantly influenced by the anodizing voltages. Nanoporous ZnO thin films were formed when 25 V and 30 V were used while ZnO thin films without nanoporous structures were formed when 10 V, 15 V and 20 V were used. XRD analysis indicated the ZnO thin films formed at 10 V to 30 V were of hexagonal wurtzite structures.
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