Abstract
Crack-free nanoporous Cu films were synthesized by electrochemical deposition of Cu–Zn alloy films by chronoamperometry (CA) at −0.5V(Ag/AgCl), followed by a two-step chemical dealloying process. Various nanoporous structures were successfully created with very low concentration of less-noble element (3–4at.% Zn), by a wet-chemical process. In addition to the Zn, less noble constituent, it is believed that Cu oxide formed during the electrochemical deposition might act as less-noble constituent as well.
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