Abstract
Nano-crystalline diamond films are successfully deposited on siliconsubstrates via the hot filament chemical vapour deposition process usinga CH4/H2/Ar gas mixture. The as-grown films are analysed by usingfield emission scanning electron microscopy, micro-Raman spectroscopyand x-ray diffraction. These results show that the films consist ofnano-diamond grains with sizes ranging from 10 to 100 nm, and argonis an important element in the formation of nano-crystalline diamonds.
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