Abstract

Multiwall boron nitride (BN) nanotubes were synthesized by a novel physical vapor deposition (PVD) method, in which the BN nanotubes grow on a compact substrate composed of AlN, γ-Al2O3, Y2O3, and carbon powders. The obtained BN nanotubes assemble in an orderly manner with a typical length of over one millimeter and a diameter of one-hundred nanometers. The hollow multiwall tubes have a spherical tip, which is presumed to be a liquid drop at the synthesis temperature, indicating the vapor–liquid–solid (VLS) growth mechanism.

Highlights

  • Boron nitride (BN) nanotubes are structurally analogue to carbon nanotubes—they substituteBand N atoms entirely for C atoms in graphitic-like sheets with nearly no change in the atomic spacing [1,2,3]—but exhibit superior thermal and chemical performances to carbon-based materials [4].there has been a growing interest in utilizing boron nitride (BN) nanotube materials in specific applications in high-temperature or chemically hazardous environments in recent years [3]

  • It is notable that the length of the nanotubes is over one millimeter and the volume of the products indicates that the BN nanotubes could be manufactured on an industrial scale

  • Multiwall BN nanotubes were synthesized by a physical vapor deposition (PVD) method, where hexagonal boron nitride (h-BN) ceramics wereInused as a BNmultiwall source

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Summary

Introduction

Boron nitride (BN) nanotubes are structurally analogue to carbon nanotubes—they substituteBand N atoms entirely for C atoms in graphitic-like sheets with nearly no change in the atomic spacing [1,2,3]—but exhibit superior thermal and chemical performances to carbon-based materials [4].there has been a growing interest in utilizing BN nanotube materials in specific applications in high-temperature or chemically hazardous environments in recent years [3]. Boron nitride (BN) nanotubes are structurally analogue to carbon nanotubes—they substitute. Afterwards, many other synthesizing methods were developed, such as laser ablation [7], chemical vapor deposition [8], the heating of milled mixtures [9,10], the plasma-jet method [11], and atom deposition [12]. Most of these methods are too complicated to be suitable for industrial manufacturing

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