Abstract
A new polyhedral oligomeric silsesquioxane (POSS) methacrylate monomer, 1-(3-(methacryloyloxy)propyl)dimethylsiloxy-3,5,7,9,11,13,15-hepta(isobutyl)pentacyclo-[9.5.1.13,9.15,15.17,13]octasiloxane ((i-Bu)7POSS-OSiMe2-MA, 1), with a flexible spacer between the cubic POSS cage and methacrylate group was synthesized to reduce steric strain and thus achieve polymethacrylates (poly(POSS-MA)s) with high molecular weight (MW). Atom transfer radical polymerization (ATRP) of 1 at high monomer concentration (1 M, corresponding to ca. 85 wt % of 1) led to polymers with the absolute number-average MW, determined by multiangle laser light scattering, Mn,MALLS = 2 350 000 (and apparent MW, measured by gel permeation chromatography with linear poly(methyl methacrylate) (PMMA) standards, Mn,GPC = 550 000). Optimization of the reaction conditions, including the ATRP catalyst, targeted degrees of polymerization, monomer concentrations, as well as a monomer feeding, resulting in the first well-defined high MW polymers with POSS moieties.
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