Abstract
Thin films of silicon carbide (SiC) have been prepared by means of pulsed laser deposition (PLD) on sapphire (Al2O3) and Si(100) substrates with a Nd-YAG laser 1064 nm. We achieved the growth of cubic silicon carbide (3C-SiC) films at the temperatures of 650°C from a SiC target in vacuum. The as-deposited films are morphologically and structurally characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray diffraction (XRD). The use of off-axis PLD method placing the sample at 90° with respect to the target leads to a good quality smooth film.
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