Abstract
A new cell design with metallic porous support was selected in order to face with the reduction of IT-SOFC’s operation temperature. Nevertheless, the excessive roughness of the porous metallic interconnect induce additional problems when a thin electrolyte layer is required. In this work, an anode material (NiO-TSZ) by Atmospheric Plasma Spraying was deposited on metallic supports (ITM) produced by PLANSEE able to cover the roughness of the support. Then, a second thin and dense electrolyte layer (YSZ) by reactive magnetron sputtering was produced on the anode material. In this study, for both processing routes, the optimal process parameters regarding the structural, morphological and electrical characterizations were investigated.
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