Abstract
Polycrystalline carbon nitride films were deposited on Si (400) substrates by electrolysis of methanol–urea solution under high voltage, at atmospheric pressure and at temperature below 350 K. Fourier transform infrared spectroscopy (FTIR) measurements suggested the existence of both single and double carbon–nitrogen bonds in the film. X-ray diffraction (XRD) spectrum showed various peaks for different d values which could be assigned to different crystalline carbon nitride phases. Film morphology was studied by scanning electron microscopy (SEM) which indicated the existence of grains with average grain size of ∼2.5 μm.
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