Abstract
The preparation of nanostructured undoped and Cu doped NiO thin films on to amorphous glass substrate via successive ionic layer absorption and reaction (SILAR) is debated. The optical and structural properties of the nanostructure undoped and Cu doped NiO thin films were studied. The characterization techniques such as UV–visible spectroscopy, Scanning Electron Microscopy and Atomic Force Microscopy were used to investigate undoped and Cu doped NiO thin films. Because of UV–Vis analysis of undoped and Cu doped NiO thin films, the optical band gap value decreased from 3.34 to 2.01 eV with the increase of Cu concentration. As a result of SEM analysis, it was seen that the nanostructures formed when the NiO thin film was enlarged changed its shape as the Cu concentration increased. In the results of AFM analysis, it was observed that copper coated on the surface began to decrease on surface roughness.
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