Abstract
Assembled monolayer of silicalite-1 (AMS) microcrystals on Si wafer for carbon nanotube (CNT) growth has been prepared by the rubbing method. Iron oxide (α-Fe2O3, hematite) catalyst films were deposited onto silicate-1 monolayers from a Fe2O3 target by radio frequency (rf)-sputtering. This approach has the potential for producing well-aligned CNTs with controlled diameter from predesigned silicalite-1 templates by catalytic chemical vapor deposition (CCVD). Silicalite-1 monolayer oriented with faces parallel to Si wafer showed only the planes in the forms {0 k 0} lines at (020), (040), (060), (080) and (0100) by XRD. The formation and growth of CNTs by CCVD were achieved on the pores of silicate-1 crystals whereby the pores can be defined as confined spaces (channels, 5.60 Å) in nanometer dimensions acting as a template for a fine dispersion of well-defined Fe2O3 (10-15 nm) particles.
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