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Abstract
AbstractPoly(methyl phenyl silane) was used to photoinitiate the polymerization of methyl methacrylate. Poly(methyl methacrylate) (PMMA), obtained this way, contains remaining polysilane chains. Photolysis of this PMMA in the presence of vinyl monomers such as styrene makes it possible to prepare block copolymers. Such PMMA prepolymers were also used to induce the polymerization of cyclohexene oxide through formation of PMMA‐attached silyl radicals and subsequent oxidation to the corresponding ions in the presence of N‐ethoxy‐2‐methylpyridinium hexafluorophosphate resulting in the formation of a block copolymer.
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