Abstract
Aligned multiwalled carbon nanotubes (MWCNTs) were grown on both sides of a metallic or metal-coated substrate by water-vapor-assisted chemical vapor deposition (CVD). Aligned CNT films with thicknesses ranging from 1 to >100 μm were obtained. By manipulating various operating factors, namely, the position of the substrate in the reactor, the amount of water vapor, the amount of catalyst, the reactor temperature, and the growth time, the morphology and thickness of these carbon nanotube films could be adjusted. This technique was used to fabricate a thermal interface material, made up of a thin copper foil covered with Cr−Au−MWCNT on both sides, that has a thermal resistance as low as 12 mm2 K/W.
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