Abstract
Transparent titanium dioxide (TiO2) thin films were prepared by e-beam evaporation technique on well-cleaned glass substrate. The pressure and deposition rate were at 3.0 x 10-6 m.bar, 3 nm/s respectively. The structural characteristic of the film were analysed using GIXRD and Raman spectroscopy. The surface morphology of the film were analysed using Atomic Force Microscopy (AFM) and XRR. The Optical properties were studied using UV-Visible and Photoluminescence spectroscopy. The electrical properties of the film is studied. GIXRD studies showed that the as-deposited films were amorphous and crystallinity of the film was increased, increase of annealing temperature. The anatase phase of the TiO2 film was conformed from the GIXRD and Raman data. The optical properties of the films varied with the annealing of film. Furthermore, the gas sensitivity, Self-Cleaning and wettability properties of the TiO2 film studied. The sensitivity towards CO2 gas has been measured under 50 ppm concentration and resistance of the film is near about 109Ω and sensing current reached 14 nA of the films. Self-Cleaning property studied in presence of sun light, post annealed film shows high self-cleaning and wettability.
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