Abstract
heterocyclic derivative contain triazole ring was synthesized and characterized the product and their structures by infrared spectroscopy, 1H-NMR, 13C-NMR and instrumental techniques. Compound (4) was synthesized by reacting of Schiff base (3) with an three moles of alkyl halide (p-phenyl phenacyl bromide). Final product played an important role in photostabilizer of polymer (PS), and showed the activity as a photostabilizer when exposed to UV light (300 hours).
Highlights
Heterocyclic compounds, which have at least 2 different atom types in the ring, are the most prevalent form of organic substrate [1,2,3]
Likewise famed as pyrrodiazole, it is an example of a class of organic heterocyclic compounds that contain nitrogen
Sulphur-containing triazole heterocycles are important because of their useful applications, which provide all of the essential components for a strong photostabilizer [7, 8], because PS has been shown to oxidize when exposed to natural sunshine [9]
Summary
Heterocyclic compounds, which have at least 2 different atom types in the ring, are the most prevalent form of organic substrate [1,2,3]. Likewise famed as pyrrodiazole, it is an example of a class of organic heterocyclic compounds that contain nitrogen. Sulphur-containing triazole heterocycles are important because of their useful applications, which provide all of the essential components for a strong photostabilizer [7, 8], because PS has been shown to oxidize when exposed to natural sunshine [9]. The photostabilization process includes using additives (preferably with a heterocyclic ring) and applying them to Polystyrene (PS) to achieve specific features in modified films, as an example improved thermal stability, multiphase physical reactions, compatibility, impact response, flexibility, and rigidity [10]
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