Abstract
We examine the local structural and electrical properties of VO2 films showing metal-to-insulator transition (MIT) by using in-situ x-ray absorption fine structure (XAFS) measurements at the V K edge and resistance measurements in the temperature range 20–120 °C. VO2 films are synthesized on Al2O3 (0001) substrates by DC magnetron sputtering deposition. X-ray diffraction measurements show that the films have b-oriented monoclinic-phase crystals at room temperature. XAFS measurements reveal a local structural transition in the films from the monoclinic (M1) to the rutile (R) phase at ∼70 °C during their heating; further, temperature-dependent resistance (R–T) measurements showed a sharp MIT in the films at ∼75 °C. Extended XAFS (EXAFS) measurements reveal non-rigid changes of V–O and V–V bond lengths from the M1 to the R phase via the M2 phase. In-situ EXAFS and R–T measurements show that the synthesized VO2 films act as Mott insulators and that their electrical property change is not proportional to their structural property change at their MIT temperature.
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