Abstract

Poly(arylene sulfone)s (PASs) were synthesized in quantitative yields by the oxidations of the corresponding fluorene-containing poly(arylene thioether)s, derived from 9,9-diarylfluorene-based dithiols and dihaloarenes, with 30% hydrogen peroxide in formic acid. PASs had good solubility in common organic solvents such as chloroform, N-methylpyrrolidone (NMP), and N,N-dimethylformamide (DMF). Highly transparent films were obtained by casting the chloroform solutions of PASs. PASs exhibited high glass transition and high decomposition temperatures (Tg 248–355 °C, Td5 > 400 °C under nitrogen).

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call