Abstract

Noria derivatives with pendant methoxy and adamantyl ester moieties (noriaMP-ADn) were synthesized by the substitution reaction of noria analogues with 12 methoxy groups (noriaMP) and 2-bromoacetyloxy-2-methyladamantane (BMA), and their degrees of introduction of adamantyl ester moieties (DI) could be controlled by the feed ratios of noriaMP and BMA. The physical properties such as solubility, film-forming ability, and thermal stability of noriaMP-ADn were also examined to assess the suitability for application as extreme ultraviolet (EUV)-resist materials. The patterning property of noriaMP-AD18 (DI=18) and noriaMP-AD54 (DI=54) was investigated in an EUV-resist system, and noriaMP-AD18 yielded higher resolution than noriaMP-AD54, providing a clear line and space pattern with a resolution of 32nm and a line-width roughness of 10.5nm by exposure dose of 9.0mJ/cm2.

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